
Axcelis Technologies Inc
ACLS
ACLS: Axcelis Technologies Inc designs, manufactures and services ion implantation and other processing equipment used in the fabrication of semiconductor chips. In addition to equipment, the company provide aftermarket lifecycle products and services, including used tools, spare parts, equipment upgrades, maintenance services and customer training. Geographically, the group has a business presence in North America, Asia Pacific and Europe, of which key revenue is derived from the Asia Pacific.
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New patents grants
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Patent Title: Hydraulic feed system for an ion source Aug. 15, 2023
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Patent Title: Method for decreasing cool down time with heated system for semiconductor manufacturing equipment Aug. 15, 2023
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Patent Title: Fluorine based molecular co-gas when running dimethylaluminum chloride as a source material to generate an aluminum ion beam Jul. 11, 2023
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Patent Title: Etching aluminum nitride or aluminum oxide to generate an aluminum ion beam Jul. 11, 2023
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Patent Title: High power wafer cooling Jun. 06, 2023
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Patent Title: Method of mixing upstream and downstream current measurements for inference of the beam current at the bend of an optical element for realtime dose control May. 09, 2023
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Patent Title: Ion source with multiple bias electrodes Jan. 03, 2023
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Patent Title: Ion source repeller Dec. 06, 2022
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Patent Title: Hydrogen generator for an ion implanter Mar. 15, 2022
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Patent Title: Stepped indirectly heated cathode with improved shielding Feb. 08, 2022
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Patent Title: Multiple arc chamber source Nov. 23, 2021
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Patent Title: Liquid metal ion source Nov. 09, 2021
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Patent Title: Scanning magnet design with enhanced efficiency Sep. 07, 2021
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Patent Title: Substrate support having customizable and replaceable features for enhanced backside contamination performance Sep. 07, 2021
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Patent Title: Hydrogen bleed gas for an ion source housing Jul. 13, 2021
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Patent Title: Scan and corrector magnet designs for high throughput scanned beam ion implanter Jun. 15, 2021
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Patent Title: Wafer soak temperature readback and control via thermocouple embedded end effector for semiconductor processing equipment May. 18, 2021
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Patent Title: In-situ wafer temperature measurement and control Jan. 26, 2021
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Patent Title: Radiant heating presoak Dec. 08, 2020
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Patent Title: Hydrogen generator for an ion implanter Nov. 24, 2020
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Patent Title: High throughput serial wafer handling end station Nov. 10, 2020
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Patent Title: Shallow angle, multi-wavelength, multi-receiver, adjustable sensitivity aligner sensor for semiconductor manufacturing equipment Oct. 06, 2020
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Patent Title: Implantation using solid aluminum iodide (ali3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products Sep. 15, 2020
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Patent Title: System and method for aligning light-transmitting birefringent workpieces Jul. 21, 2020
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Patent Title: Reduction of condensed gases on chamber walls via heated chamber housing for semiconductor processing equipment Jul. 14, 2020
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Patent Title: Ion source with tailored extraction shape Jul. 14, 2020
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Patent Title: Method to provide consistent electrostatic clamping through real time control of electrostatic charge deposition in an electrostatic chuck Jun. 23, 2020
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Patent Title: Film stabilization through novel materials modification of beamline components Jun. 23, 2020
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Patent Title: Hydrogen co-gas when using aluminum iodide as an ion source material Jun. 09, 2020
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Patent Title: Low conductance self-shielding insulator for ion implantation systems Jun. 09, 2020
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Patent Title: Tetrode extraction apparatus for ion source Feb. 25, 2020
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Patent Title: Scan and corrector magnet designs for high throughput scanned beam ion implanter Feb. 04, 2020
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Patent Title: Lanthanated tungsten ion source and beamline components Jan. 14, 2020
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Patent Title: System and method of arc detection using dynamic threshold Dec. 24, 2019
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Patent Title: Beam profiling speed enhancement for scanned beam implanters Nov. 19, 2019
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Patent Title: Wafer cooling system and method Sep. 03, 2019
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Patent Title: Two-axis variable width mass resolving aperture with fast acting shutter motion Aug. 27, 2019
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Patent Title: In situ beam current monitoring and control in scanned ion implantation systems Aug. 27, 2019
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Patent Title: Ion source repeller shield comprising a labyrinth seal Jul. 23, 2019
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Patent Title: Phosphine co-gas for carbon implants Jul. 23, 2019
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Patent Title: Rf resonator for ion beam acceleration Jul. 02, 2019
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Patent Title: Charge integration based electrostatic clamp health monitor Jun. 18, 2019
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Patent Title: Phosphorous trifluoride co-gas for carbon implants Apr. 09, 2019
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Patent Title: Outgassing impact on process chamber reduction via chamber pump and purge Mar. 12, 2019
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Patent Title: Adjustable circumference electrostatic clamp Jan. 22, 2019
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Patent Title: In-situ cleaning using hydrogen peroxide as co-gas to primary dopant or purge gas for minimizing carbon deposits in an ion source Jan. 01, 2019
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Patent Title: Wafer temperature control with consideration to beam power input Nov. 13, 2018
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Patent Title: Implantation using solid aluminum iodide (ali3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products Oct. 02, 2018
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Patent Title: Low conductance self-shielding insulator for ion implantation systems Sep. 11, 2018
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Patent Title: Integrated emissivity sensor alignment characterization Aug. 07, 2018
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